IndiumV3, Main, Repository, bibRecord, 000032

Suppressing Instability of Liquid Thin Films by a Fibril Network and its Application to Micropatterning without a Residual Layer

Identifieur interne : 000032 ( Main/Repository ); précédent : 000031; suivant : 000033

Suppressing Instability of Liquid Thin Films by a Fibril Network and its Application to Micropatterning without a Residual Layer

Auteurs : RBID : Pascal:14-0085547

Descripteurs français

Pascal (Inist)
- Ethylène oxyde polymère, Solution alcoolique, Cristallisation solution, Gélification, Cinétique, Mécanisme, Gel physique, Structure fibrillaire, Dépôt centrifugation, Film liquide, Démouillage, Silicium, Formation motif, Polymérisation photochimique, Prépolymère, Acrylate polymère, Gel colloïdal, Topographie surface, Oxyde d'indium, Oxyde de zinc, Semiconducteur, Photoconductivité, Rayonnement UV, Caractéristique temporelle, Etude expérimentale, Propriété électrique, Cristallisation sous pression, Lithographie molle, Lithographie force capillaire, Diacrylate de polyéthylèneglycol polymère, Dimension motif.

English descriptors

KwdEn :
- Acrylate polymer, Alcoholic solution, Colloidal gel, Dewetting, Electrical properties, Ethylene oxide polymer, Experimental study, Fibrillar structure, Gelation, Indium oxide, Kinetics, Liquid film, Mechanism, Patterning, Photoconductivity, Photopolymerization, Physical gel, Prepolymer, Semiconductor materials, Silicon, Solution crystallization, Spin-on coating, Surface topography, Time curve, Ultraviolet radiation, Zinc oxide.

Abstract

This study proposes a method to coat thin films of non-volatile solvents on substrates. A small amount of crystalline polymer dissolved in solvents forms a network of crystalline fibrils during the coating process. The network suppresses dewetting of the solvent liquid and helps the liquid film sustaining on the substrate. This strategy can be used in soft lithography to generate micropatterns of diverse materials without having a residual layer. This process does not request etching for achieving residual layer-free micropatterns, which has been a long challenge in soft lithography. As examples, we demonstrate micropatterns of polymer hydrogels and metal oxides (ZnO, In₂O₃).

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Pascal:14-0085547

Le document en format XML

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<author><name>JAEYOON PARK</name>
<affiliation wicri:level="3"><inist:fA14 i1="01"><s1>Department of Materials Science and Engineering, Yonsei University, 134 Shinchon-dong</s1>
<s2>Seoul</s2>
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<sZ>2 aut.</sZ>
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<country>Corée du Sud</country>
<placeName><settlement type="city">Séoul</settlement>
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<author><name>MINWOO PARK</name>
<affiliation wicri:level="3"><inist:fA14 i1="01"><s1>Department of Materials Science and Engineering, Yonsei University, 134 Shinchon-dong</s1>
<s2>Seoul</s2>
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<country>Corée du Sud</country>
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<author><name>UNYONG JEONG</name>
<affiliation wicri:level="3"><inist:fA14 i1="01"><s1>Department of Materials Science and Engineering, Yonsei University, 134 Shinchon-dong</s1>
<s2>Seoul</s2>
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<term>Electrical properties</term>
<term>Ethylene oxide polymer</term>
<term>Experimental study</term>
<term>Fibrillar structure</term>
<term>Gelation</term>
<term>Indium oxide</term>
<term>Kinetics</term>
<term>Liquid film</term>
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<term>Photopolymerization</term>
<term>Physical gel</term>
<term>Prepolymer</term>
<term>Semiconductor materials</term>
<term>Silicon</term>
<term>Solution crystallization</term>
<term>Spin-on coating</term>
<term>Surface topography</term>
<term>Time curve</term>
<term>Ultraviolet radiation</term>
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<keywords scheme="Pascal" xml:lang="fr"><term>Ethylène oxyde polymère</term>
<term>Solution alcoolique</term>
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<term>Lithographie molle</term>
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<term>Diacrylate de polyéthylèneglycol polymère</term>
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<front><div type="abstract" xml:lang="en">This study proposes a method to coat thin films of non-volatile solvents on substrates. A small amount of crystalline polymer dissolved in solvents forms a network of crystalline fibrils during the coating process. The network suppresses dewetting of the solvent liquid and helps the liquid film sustaining on the substrate. This strategy can be used in soft lithography to generate micropatterns of diverse materials without having a residual layer. This process does not request etching for achieving residual layer-free micropatterns, which has been a long challenge in soft lithography. As examples, we demonstrate micropatterns of polymer hydrogels and metal oxides (ZnO, In<sub>2</sub>
O<sub>3</sub>
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<fA14 i1="01"><s1>Department of Materials Science and Engineering, Yonsei University, 134 Shinchon-dong</s1>
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<fC01 i1="01" l="ENG"><s0>This study proposes a method to coat thin films of non-volatile solvents on substrates. A small amount of crystalline polymer dissolved in solvents forms a network of crystalline fibrils during the coating process. The network suppresses dewetting of the solvent liquid and helps the liquid film sustaining on the substrate. This strategy can be used in soft lithography to generate micropatterns of diverse materials without having a residual layer. This process does not request etching for achieving residual layer-free micropatterns, which has been a long challenge in soft lithography. As examples, we demonstrate micropatterns of polymer hydrogels and metal oxides (ZnO, In<sub>2</sub>
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Suppressing Instability of Liquid Thin Films by a Fibril Network and its Application to Micropatterning without a Residual Layer

Suppressing Instability of Liquid Thin Films by a Fibril Network and its Application to Micropatterning without a Residual Layer

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Abstract

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